Kinetics Evaluation of Passive Oxidation at High Temperature of Silicon Nitride Used in the Fabrication of Lightweight Metal Matrix Composites

In the present work, passive oxidation kinetics of silicon nitride α-Si3N4 and (α+β)-Si3N4 powders at different temperatures from 1000 to 1200 °C were evaluated. Oxidation these was carried out improve wettability pressureless infiltration AZ91E Mg-alloy. The kinetic constant (kp) values oxide layer depth calculated. constants kp, 9.11e-16 6.35e-16 kg2/m4s 4.25 nm 3.69 nm, for (α+β)-Si3N4, respectively. Furthermore, surface performed in order achieve affinity between magnesium alloy. Therefore, manufacture AZ91E/Si3N4 matrix composite materials successfully achieved by spontaneous process a temperature 800 °C. • Changes identify β-Si3N4 presence Si3N4 powders. SiO2 amorphous coating produced on reduce contact angle Passive improves